Plasma Physics
Radiofrequency Laboratory
Plasma Physics
Radiofrequency Laboratory
Capacitively coupled RF reactor
This configuration is primarily comprised of a capacitively coupled RF reactor, where the vacuum chamber is made of stainless steel with a height of 35.7 cm and an internal diameter of 40 cm.
The chamber has 2 inlets for gas to pass through, where the gas flow is controlled with 2 flow meters. The upper part of the chamber is equipped with penning and pirani type pressure gauges. To achieve the vacuum inside the chamber there are 2 vacuum pumps, the rotary pump and a turbomolecular pump. The side of the chamber has a series of windows used for multiple purposes, particularly for electrical and optical diagnostics. Two RF generators (13.56 MHz and 2.26 MHz) are used to produce the plasma under different experimental conditions. Thin films are deposited in the RF reactor combined with a high power laser to form a conventional pulsed laser deposition (PLD) system with a dual radio frequency (RF) plasma, known as plasma enhanced PLD (PE-PLD).
Power electrode
A current and voltage probe connected to a Tektronix DPO7354C high-frequency oscilloscope is used to measure current and voltage of the power electrode.
3D profilometer
The characterizations of the thin films deposited in the RF reactor together with PLD are carried out using a 3D profilometer to study the thickness of the films.
Capacitively coupled RF reactor
This configuration is primarily comprised of a capacitively coupled RF reactor, where the vacuum chamber is made of stainless steel with a height of 35.7 cm and an internal diameter of 40 cm.
The chamber has 2 inlets for gas to pass through, where the gas flow is controlled with 2 flow meters. The upper part of the chamber is equipped with penning and pirani type pressure gauges. To achieve the vacuum inside the chamber there are 2 vacuum pumps, the rotary pump and a turbomolecular pump. The side of the chamber has a series of windows used for multiple purposes, particularly for electrical and optical diagnostics. Two RF generators (13.56 MHz and 2.26 MHz) are used to produce the plasma under different experimental conditions. Thin films are deposited in the RF reactor combined with a high power laser to form a conventional pulsed laser deposition (PLD) system with a dual radio frequency (RF) plasma, known as plasma enhanced PLD (PE-PLD).
Power electrode
A current and voltage probe connected to a Tektronix DPO7354C high-frequency oscilloscope is used to measure current and voltage of the power electrode.
3D profilometer
The characterizations of the thin films deposited in the RF reactor together with PLD are carried out using a 3D profilometer to study the thickness of the films.
Welcome to the Radiofrequency Laboratory. Directed by professor Heman Bhuyan. In this laboratory we carry out experimental research in Plasma Physics.
We invite you to click on each of the highlighted points to learn more about our techniques and equipment.